Electrochemical Technology CorporationDryScrub

 

DryScrub Performance Snapshot

TEOS Process in Verticle reactor, 200 mm wafers

TEOS System configured as Originally Specified

 

0.20m

0.23m

1.00m

1.50m

Total

 

Top Tube

+33

+21

+3

+20

+77

Number of

Bottom Tube

+76

+2

+1

+4

+83

Particles

TEOS System Retrofitted and Operating with DryScrub  Plasma Scrubber

 

0.20m

0.23m

1.00m

1.50m

Total

 

Top Tube

-2

+4

+1

+6

+9

Number of

Bottom Tube

-5

+6

+1

+3

+5

Particles

PECVD Nitride Application Monitoring DryScrub Performance Over Four (4) Months of Operation

95% brown powder (SiH
4 by-product) reduction

White powder on the exhaust side:
<3 weeks maintenance cycle improved to >3 months.


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Copyright 2001 DryScrub ETC.

Tel: +1-408-DryScrub

(379-7278)

+1-510-818-9333

 

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