SUMMARY TABLE OF DryScrub® COLLECTION CAPACITY

WAFER

REACTOR

DryScrub®

REACTOR

HYDRIDE GAS

COLLECTIONCAPACITY

(liters)

CONST. "C", (For Electrode Life Expectancy Calculation)

Processes

Input Gases

Waste Solids

Waste Gases

Nitride

Si2H2Cl + NH3

Nitride + NH4Cl

N2 + H2 + NH3

600

9.2 105

PSG

SiH4 + PH3 + O2

PSG

O2 + H2O

1,800

4.2 106

BPSG

SiH4 + PH3 + B2H6 + O2

BPSG

O2 + H2O

1,800

4.2 106

TEOS OXIDE

Si(OC2H5)4 + O2/O3

OXIDE

O2 + H2O + CO2 + Ethyl Group

1,700

1.7 106

PECVD NITRIDE

SiH4 + NH3 + N2O

NITRIDE

N2 + H2 + NH3 + H2O

1,800

2.7 106

PECVD OXYNIT.

SiH4 + NH3 + N2O

OXYNITRIDE

N2 + H2 + NH3 + H2O

1,800

2.7 106

PECVD OXIDE

SiH4 + N2O

OXIDE

N2 + O2 + H2O

1,800

1.7 106

As/P/B Doped Poly

SiH4 + AsH3/PH3/B2H6

As/P/B Doped Si

H2

4,000

4.2 106

Amorphous Si

SiH4/Si2H6

Amorphous Si

H2

4,000/2,000

4.2 106

W Silicide

WF6 + SiF4 + H2

SiWx + Si(F)

H2

3,800

1.0 106