Electrochemical Technology CorporationDryScrub

 

Process:

LPCVD TEOS

Quantity:

Multiple Process Systems

Pumps:

Dry and Oil Sealed

DryScrub Systems:

Multiple

Reported Benefits derived from DryScrub Installations:

  1. Relative to dry pumps:
    1. failures and rebuilds reduced from 6 in 12 months, to none in over 3 years.
    2. wafer load losses due to particle caused failures reduced none in over 3 years.
    3. exhaust side manifold maintenance, caused by particle accumulation, reduced from 3-4 week intervals to 6 month intervals.
    4. purge gas consumption reduced.

 

  1. Relative to oil sealed pumps, and filtration systems:
    1. no pump in-process failures in over 3 years; major pump rebuilds reduced from 3 month intervals, to scheduled minor preventative maintenance once every year.
    2. oil filter maintenance reduced by a factor of 10.
    3. fluid losses significantly reduced to make-up oil lost as a function of filter change.
    4. pump and fluid related maintenance reduced by a factor of 10.
    5. exhaust side manifold maintenance, caused by oil vapour and particle accumulation reduced.
    6. purge gas consumption, and gas velocity reduced, reducing oil vapour loss and manifold contamination.

 

  1. Process Benefits:
    1. process tool availability-uptime greatly improved.
    2. process reproducibility improved.
    3. particle related wafer load losses decreased.
    4. significant reduction of particle count on wafers.

 

  1. Other Benefits Related to DryScrub Installations:
    1. predictability of, and reduced maintenance events have allowed re-direction of personnel to other fab requirements.
    2. treatment of undiluted deposition proccss effluent gases results in hazardous and/or toxic waste reduction, consequently reducing operating costs.
    3. personnel exposure to hazardous and/or toxic wastes is reduced.

 

  1. Return On Investment, Statement During Interview:
    1. relative to equipment considerations, configured with dry or oil sealed pumps, ROI was achieved in less than a year.
    2. ROI is achieved very quickly, relative to increased productivity; particularly, the reduction of just one wafer load loss more than pays for a DryScrub System purchase, installation, and a year of operating costs.


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Copyright 2001 DryScrub ETC.

Tel: +1-408-DryScrub

(379-7278)

+1-510-818-9333

 

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(379-7278)

 

 

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